High temperature and high pressure method VS chemical vapor deposition method
High-Pressure High-Temperature (HPHT)：
高溫高壓法(HPHT)是人為模擬天然鑽石在地下200公里深處的溫度、壓力，將鑽石晶種放置於大型的機力壓機中施加高壓以及高溫。機器能夠產生非常高的壓力和溫度。溫度約為1300度攝氏至1500度攝氏，壓力約為40,000至60,000個大氣壓力。碳晶格會根據鑽石晶種重新排列，並變成鑽石，隨時間長出一層層的鑽石結晶，直到生長至需要的克拉重量。
Chemical Vapor Deposition (CVD)：
The basic principle of CVD is to place the diamond seed in an ion gas reactor in a vacuum and introduce a carbon-rich gas at low temperatures. Through the high-temperature decomposition of methane gas, plasma of carbon atoms is generated, allowing the carbon atoms to form a thin film on the diamond and deposit diamond layers.
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